Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products

Abstract

The thin film deposition in DBDs fed with Ar/HMDSO/O2 mixtures was studied by comparingthe FT-IR spectra of the deposits with the GC-MS analyses of the exhaust gas. Under theexperimental conditions investigated, oxygen addition does not enhance the activation of themonomer while it highly influences the chemical composition and structure of the depositedcoating as well as the quali-quantitative distribution of by-products in the exhaust. Withoutoxygen addition a coating with high monomer structureretention is obtained and the exhaust containsseveral by-products such as silanes, silanols, and linearand cyclic siloxanes. The dimethylsiloxane unit seemsto be the most important building block of oligomers.Oxygen addition to the feed is responsible for anintense reduction of the organic character of the coatingas well as for a steep decrease, below the quantificationlimit, of the concentration of all by-productsexcept silanols. Some evidences induce to claim thatthe silanol groups contained in the deposits are formedthrough heterogeneous (plasma-surface) reactions.


Autore Pugliese

Tutti gli autori

  • F. Fanelli; S. Lovascio; R. d'Agostino;F. Arefi-Khonsari; F. Fracassi

Titolo volume/Rivista

Plasma processes and polymers


Anno di pubblicazione

2010

ISSN

1612-8850

ISBN

Non Disponibile


Numero di citazioni Wos

Nessuna citazione

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Numero di citazioni Scopus

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Settori ERC

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Codici ASJC

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