Silicon Derivate Layers/Films Produced by Silicatein-Mediated Templating and Process for Making the Same

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Abstract

The present invention concerns a process for preparing products having layers/films of silicon derivates comprising the following steps: a) Preparing a mould made of elastomeric material and having a plurality of grooves with mutual spacing in the range from 1 μm to 1 mm; b) incubating the mould of step a) in a solution of silicateins in a range of temperatures from 2 to 10° C. and in a range of time from a few minutes to 103 hours; c) providing a target substrate of silicon or oxides thereof; d) transferring the silicateins from the mould to the said target substrate through soft lithography technique for a time period from a few seconds to 103 hours and removing the elastomeric mould; e) incubating the substrate with patterned silicateins of step d) in a solution of one or more precursors belonging to the class of silane compounds for a time period in a range from a few seconds to 103 hours in a temperature range from 2° C. to 25° C. The invention concerns also a product obtainable by the disclosed process having remarkable electrical features.

Classe Tecnologica

B - Performing operations, transporting

Patent Office

United States Patent and Trademark Office

Numero Deposito

US2011281077

Anno Deposito

2010

Anno Concessione

2011

Inventori Pugliesi

  • Pisignano Dario
  • Biasco Adriana Lucia Angela
  • Camposeo Andrea
  • Pagliara Stefano
  • Polini Alessandro

Tutti gli inventori

  • Dario Pisignano
  • Adriana Lucia Angela Biasco
  • Andrea Camposeo
  • Stefano Pagliara
  • Alessandro Polini
  • Heinz -christoph Schroder
  • Werner E.g. Muller

Titolari pugliesi

  • BIASCO ADRIANA LUCIA ANGELA
  •  CAMPOSEO ANDREA
  • PAGLIARA STEFANO
  •  PISIGNANO DARIO
  •  POLINI ALESSANDRO

Tutti i titolari

  • BIASCO ADRIANA LUCIA ANGELA
  •  CAMPOSEO ANDREA
  • PAGLIARA STEFANO
  •  PISIGNANO DARIO
  •  POLINI ALESSANDRO
  • MUELLER WERNER E G
  •  SCHROEDER HEINZ-CHRISTOPH