Silicon derivate layers/films produced by silicatein-mediated templating and process for making the same
Abstract
The present invention concerns a process for preparing products having layers/films of silicon derivates comprising the following steps: a) Preparing a mould made of elastomeric material and having a plurality of grooves with mutual spacing in the range from 1 µm to 1mm;b) incubating the mould of step a) in a solution of silicateins in a range of temperatures from 2 to 10°C and in a range of time from few minutes to 10 3 hours; c) providing a target substrate of silicon or oxides thereof d) transferring the silicateins from the mould to the said target substrate through soft lithography technique for a time period from few seconds to 10 3 hours and removing the elastomeric mould; e) incubating the substrate with patterned silicateins of step d) in a solution of one or more precursors belonging to the class of silane compounds for a time period in a range from few seconds to 10 3 hours in a temperature range from 2°C to 25°C. The inventions concerns also a product obtainable by the disclosed process having remarkable electrical features.
Classe Tecnologica
C - Chemistry and Metallurgy
Patent Office
European Patent Office
Numero Deposito
EP2246435
Anno Deposito
2009
Anno Concessione
2010
Inventori Pugliesi
- Pisignano Dario
- Biasco Adriana Lucia Angela
- Camposeo Andrea
- Pagliara Stefano
- Polini Alessandro
Tutti gli inventori
- Pisignano Dario
- Biasco Adriana Lucia Angela
- Camposeo Andrea
- Pagliara Stefano
- Polini Alessandro
- Mueller Werner
Titolari pugliesi
- Non ci sono titolari pugliesi
Tutti i titolari
- Consiglio Nazionale Delle Ricerche
- NANOTECMARIN
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