Thin Film Deposition on Open-Cell Foams by Atmospheric Pressure Dielectric Barrier Discharges

Abstract

Thin films are deposited on open-cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric-covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three-dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X-ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma-treated foams under all explored experimental conditions.


Autore Pugliese

Tutti gli autori

  • F. Fanelli; F. Fracassi

Titolo volume/Rivista

Plasma processes and polymers


Anno di pubblicazione

2015

ISSN

1612-8869

ISBN

Non Disponibile


Numero di citazioni Wos

Nessuna citazione

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Settori ERC

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Codici ASJC

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