Thin Film Deposition on Open-Cell Foams by Atmospheric Pressure Dielectric Barrier Discharges
Abstract
Thin films are deposited on open-cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric-covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three-dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X-ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma-treated foams under all explored experimental conditions.
Autore Pugliese
Tutti gli autori
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F. Fanelli; F. Fracassi
Titolo volume/Rivista
Plasma processes and polymers
Anno di pubblicazione
2015
ISSN
1612-8869
ISBN
Non Disponibile
Numero di citazioni Wos
Nessuna citazione
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Numero di citazioni Scopus
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Ultimo Aggiornamento Citazioni
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Settori ERC
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Codici ASJC
Non Disponibile
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