Abstract

Nowadays, atmospheric pressure cold plasmas, particularly in dielectric barrier discharge (DBD)configuration, attract significant interest in the field of surface processing of materials.Fluorocarbon containing DBDs have also been studied, but the state of the art in this field is atits early stages, especially if compared to low pressure plasmas, which have been widely andsuccessfully employed for the etching of inorganic and organic materials, for the deposition offluoropolymers as well as for the treatment of synthetic and natural polymers. This contribution willprovide an overview of our recent studies on fluorocarbon containing DBDs and will presentresults on the deposition of fluoropolymers concerning the tuning of the chemical composition ofthe deposits, the etching-deposition competition and the influence of feed gas contaminants (i.e.air and water vapour).

Autore Pugliese

• Fanelli Fiorenza

Tutti gli autori

• Fanelli F.

Titolo volume/Rivista

Surface engineering

Anno di pubblicazione

2012

ISSN

1743-2944

ISBN

Non Disponibile

Numero di citazioni Wos

Nessuna citazione

Ultimo Aggiornamento Citazioni

Non Disponibile

Numero di citazioni Scopus

Non Disponibile

Ultimo Aggiornamento Citazioni

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Settori ERC

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Codici ASJC

Non Disponibile