Abstract

Optical emission spectroscopy has been used to characterize diamond deposition microwave chemical vapour deposition (MWCVD) plasmas operating at high power density. Electron temperature has been deduced from H atom emission lines while H-atom mole fraction variations have been estimated using actinometry technique, for a wide range of working conditions: pressure 25-400 hPa and MW power 600-4000 W. An increase of the pressure from 14 hPa to 400 hPa with a simultaneous increase in power causes an electron temperature decrease from 17,000 K to 10,000 K and a H atom mole fraction increase from 0.1 to up to 0.6. This last value however must be considered as an upper estimate due to some assumptions made as well as experimental uncertainties.

Autore Pugliese

• Cicala Grazia

Tutti gli autori

• A. Gicquel ; N. Derkaoui ; C. Rond ; F. Benedic ; G. Cicala ; D. Moneger ; K. Hassouni

Titolo volume/Rivista

Chemical physics

Anno di pubblicazione

2012

ISSN

0301-0104

ISBN

Non Disponibile

Numero di citazioni Wos

Nessuna citazione

Ultimo Aggiornamento Citazioni

Non Disponibile

Numero di citazioni Scopus

Non Disponibile

Ultimo Aggiornamento Citazioni

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Settori ERC

Non Disponibile

Codici ASJC

Non Disponibile