Plasma-plasmonics synergy in the Ga-catalyzed growth of Si-nanowires
Abstract
This paper reports on the growth of Si nanowires (NWs) by SiH4/H2 plasmas using the non-noble Gananoparticles(NPs) catalysts. A comparative investigation of conventional Si-NWs vapour-liquid-solid(VLS) growth catalyzed by Au NPs is also reported. We investigate the use of a hydrogen plasma and of aSiH4/H2 plasma for removing Ga oxide shell and for enhancing the Si dissolution into the catalyst, respectively.By exploiting the Ga NPs surface plasmon resonance (SPR) sensitivity to their surface chemistry,the SPR characteristic of Ga NPs has been monitored by real time spectroscopic ellipsometry in orderto control the hydrogen plasma/Ga NPs interaction and the involved processes (oxide removal and NPsdissolution by volatile gallium hydride). Using in situ laser reflectance interferometry the metal catalyzedSi NWs growth process has been investigated to find the effect of the plasma activation on the growthkinetics. The role of atomic hydrogen in the NWs growth mechanism and, in particular, in the SiH4 dissolutioninto the catalysts, is discussed. We show that while Au catalysts because of the re-aggregationof NPs yields NWs that do not correspond to the original size of the Au NPs catalyst, the NWs grown bythe Ga catalyst retains the diameter dictated by the size of the Ga NPs. Therefore, the advantage of GaNPs as catalysts for controlling NWs diameter is demonstrated.
Autore Pugliese
Tutti gli autori
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G.V. Bianco; M. M. Giangregorio; P. Capezzuto; M. Losurdo; T.H. Kim; A.S. Brown; G. Bruno
Titolo volume/Rivista
Materials science & engineering. B, Solid-state materials for advanced technology
Anno di pubblicazione
2012
ISSN
0921-5107
ISBN
Non Disponibile
Numero di citazioni Wos
Nessuna citazione
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Numero di citazioni Scopus
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Settori ERC
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Codici ASJC
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