Abstract

Gold nanoclusters are deposited directly on silicon by sputtering of a target of metallic gold usingan argon plasma to provide a semiconductor-based plasmonic platform. The effects of annealingand substrate temperatures during the nanoparticles deposition and of the silicon surface energy onthe shape of the nanoparticles and resulting surface plasmon resonance are investigated. The Aunanoparticles are characterized optically, structurally and morphologically using spectroscopic ellipsometry,transmission electron microscopy and atomic force microscopy to establish a correlationamong the Au/Si interface reactivity, the Au nanoparticles shape and plasmonic resonance properties.It is found that post-growth annealing up to 600 C of nanoparticles deposited at 60 C causesaggregation of nanoparticles. Increasing the temperature of the substrate during the sputtering ofgold on Si yields pancake-like nanoparticles with a large Si/Au interface reactivity forming a goldsilicidesinterface layer. The O2 plasma treatment of the Si surface forming a thin intentional SiO2interface layer prevents the Au/Si interdiffusion yielding polyedrical nanoparticles whose plasmonresonance can be shifted down to 1.5 eV

Autore Pugliese

• Bianco Giuseppe Valerio , Losurdo Maria , Giangregorio Maria Michela

Tutti gli autori

• M.M. Giangregorio; G.V. Bianco; P. Capezzuto; G. Bruno; M. Losurdo; A.A. Suvorova; M. Saunders

Titolo volume/Rivista

Journal of nanoscience and nanotechnology

Anno di pubblicazione

2012

ISSN

1533-4880

ISBN

Non Disponibile

Numero di citazioni Wos

Nessuna citazione

Ultimo Aggiornamento Citazioni

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Numero di citazioni Scopus

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Ultimo Aggiornamento Citazioni

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Settori ERC

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Codici ASJC

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