On the relationship between the structure and the barrier performance of plasma deposited silicon dioxide-like films
Abstract
Silicon dioxide-like barrier films were deposited by plasma enhanced chemical vapor deposition fromdifferent siloxane and silane precursors. The variation of the precursor was investigated as a route to obtainsilicon dioxide-like films with different structures, densities and hence barrier performances.Although the films were characterized by the same elemental composition, some differences in film densityand porosity were evidenced from optical properties measurements and from the shift of the SiOSi infraredabsorption band position. These differences were correlated with film microstructure and in turn withbarrier performances. The results confirmed that films with high density and low porosity performed betteras single inorganic barrier layers for food-packaging
Autore Pugliese
Tutti gli autori
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A.M. Coclite; A. Milella; F. Palumbo; R. d'Agostino
Titolo volume/Rivista
Surface & coatings technology
Anno di pubblicazione
2010
ISSN
0257-8972
ISBN
Non Disponibile
Numero di citazioni Wos
Nessuna citazione
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Numero di citazioni Scopus
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Settori ERC
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Codici ASJC
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