On the relationship between the structure and the barrier performance of plasma deposited silicon dioxide-like films

Abstract

Silicon dioxide-like barrier films were deposited by plasma enhanced chemical vapor deposition fromdifferent siloxane and silane precursors. The variation of the precursor was investigated as a route to obtainsilicon dioxide-like films with different structures, densities and hence barrier performances.Although the films were characterized by the same elemental composition, some differences in film densityand porosity were evidenced from optical properties measurements and from the shift of the SiOSi infraredabsorption band position. These differences were correlated with film microstructure and in turn withbarrier performances. The results confirmed that films with high density and low porosity performed betteras single inorganic barrier layers for food-packaging


Autore Pugliese

Tutti gli autori

  • A.M. Coclite; A. Milella; F. Palumbo; R. d'Agostino

Titolo volume/Rivista

Surface & coatings technology


Anno di pubblicazione

2010

ISSN

0257-8972

ISBN

Non Disponibile


Numero di citazioni Wos

Nessuna citazione

Ultimo Aggiornamento Citazioni

Non Disponibile


Numero di citazioni Scopus

Non Disponibile

Ultimo Aggiornamento Citazioni

Non Disponibile


Settori ERC

Non Disponibile

Codici ASJC

Non Disponibile