Abstract

In this work we demonstrate for the first time the micro- and nanostructuring of graphene bymeans of UV-nanoimprint lithography. Exfoliated graphene on SiO2 substrates, as well asgraphene deposited by chemical vapor deposition (CVD) on polycrystalline nickel and copper,and transferred CVD graphene on dielectric substrates, were used to demonstrate that ourtechnique is suitable for large-area patterning (2  2 cm2) of graphene on various types ofsubstrates. The demonstrated fabrication procedure of micrometer as well as nanometer-sizedgraphene structures with feature sizes down to 20 nm by a wafer-scale process opens up anavenue for the low-cost and high-throughput manufacturing of graphene-based optical andelectronic applications. The processed graphene films show electron mobilities of up to4:6  103 cm2 V-1 s-1, which confirms them to exhibit state-of-the-art electronic quality withrespect to the current literature.

Autore Pugliese

• Losurdo Maria , Giangregorio Maria Michela

Tutti gli autori

• I. Bergmair; W. Hackl; M. Losurdo; C. Helgert; G. Isic; M. Rohn; M.M. Jakovljevic; T. Mueller; M.M. Giangregorio; E.-B. Kley; T. Fromherz; R. Gajic; T. Pertsch; G. Bruno; M. Muehlberger

Titolo volume/Rivista

Nanotechnology

Anno di pubblicazione

2012

ISSN

0957-4484

ISBN

Non Disponibile

Numero di citazioni Wos

Nessuna citazione

Ultimo Aggiornamento Citazioni

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Numero di citazioni Scopus

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Ultimo Aggiornamento Citazioni

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Settori ERC

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Codici ASJC

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