Effect of the gate metal work function on water-gated ZnO thin-film transistor performance
Abstract
ZnO thin films, prepared using a printing-compatible sol-gel method involving a thermal treatmentbelow 400 °C, are proposed as active layers in water-gated thin-film transistors (WG-TFTs). Thethin-film structure and surface morphology reveal the presence of contiguous ZnO crystalline(hexagonal wurtzite) with isotropic nano-grains as large as 10nm characterized by a preferentialorientation along the a-axis. The TFT devices are gated through a droplet of deionized waterby means of electrodes characterized by different work functions. The high capacitance ofthe electrolyte allowed operation below 0.5V. While the Ni, Pd, Au and Pt gate electrodes areelectrochemically stable in the inspected potential range, electrochemical activity is revealed for theW one. Such an occurrence leads to an increase of capacitance (and current), which is ascribed to ahigh output current from the dissolution of a lower capacitance W-oxide layer. The environmentalstability of the ZnO WG-TFTs is quite good over a period of five months
Autore Pugliese
Tutti gli autori
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M. Singh; M.Y. Mulla; M.V. Santacroce; M. Magliulo; C. Di Franco; K. Manoli; D. Altamura; C. Giannini; N. Cioffi; G. Palazzo; G. Scamarcio; L. Torsi
Titolo volume/Rivista
Journal of physics. D, Applied physics
Anno di pubblicazione
2016
ISSN
0022-3727
ISBN
Non Disponibile
Numero di citazioni Wos
Nessuna citazione
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Numero di citazioni Scopus
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Settori ERC
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Codici ASJC
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