Root architecture and morphometric analysis of Arabidopsis thaliana grown in Cd/Cu/Zn-gradient agar dishes: A new screening technique for studying plant response to metals
Abstract
A new screening strategy using Petri dishes with a gradient of distances between germinating seeds and a metal-contaminated medium was used for studying alterations in root architecture and morphology of Arabidopsis thaliana treated with cadmium, copper and zinc at sub-toxic concentrations. Metal concentrations in the dishes were determined by anodic stripping voltammetry on digested agar samples collected along the gradient, and kriging statistical interpolation method was performed. After two weeks, all agar dishes were scanned at high resolution and the root systems analyzed. In the presence of all the three metals, primary root length did not significantly change compared to controls, excepting for zinc applied alone (+45% of controls). In metal-treated seedlings, root system total length increased due to the higher number of lateral roots. The seedlings closer to the agar sectors including metals showed a marked curvature and a higher root branching in comparison to those further away from the metals. This behavior, together with an observed increase in root diameter in metal-treated seedlings could be interpreted as compensatory growth, and a thicker roots could act as a barrier to protect root from the metals. We therefore propose that the remodeling of the root architecture in response to metals could be a pollution 'escaping strategy' aimed at seeking metal-free Patches.
Autore Pugliese
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GATTULLO C.E.;TERZANO R.
Titolo volume/Rivista
Non Disponibile
Anno di pubblicazione
2015
ISSN
0981-9428
ISBN
Non Disponibile
Numero di citazioni Wos
Nessuna citazione
Ultimo Aggiornamento Citazioni
Non Disponibile
Numero di citazioni Scopus
14
Ultimo Aggiornamento Citazioni
Non Disponibile
Settori ERC
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Codici ASJC
Non Disponibile
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