Abstract

We developed an ion accelerator with a double accelerating gap system supplied by two power generators of different polarity.-The ions were generated by laser ion source technique. The laser plasma induced by an excimer KrF laser, freely expanded before the action of accelerating fields. After the first gap action, the ions were again accelerated by a second gap. The total acceleration can imprint a maximum ion energy up to 160 keV per charge state. We analyzed the extracted charge from a Cu target as a function of the accelerating voltage at laser energy of 9, 11 and 17 mJ deposited on a spot of 0.005 cm2. The peak of current density was 3.9, 5.3 mA for the lower and medium laser energy at 60 kV. At the highest laser energy, the maximum output current was 11.7 mA with an accelerating voltage of 50 kV. The maximum ion dose was estimated to be of 1012 ions/cm2. Under the condition of 60 kV accelerating voltage and 5.3 mA output current the normalized emittance of the beam measured by pepper pot method was 0.22 π mm mrad.

Autore Pugliese

• Nassisi Vincenzo , Lorusso Antonella

Tutti gli autori

• A. Lorusso , M.V. Siciliano , L. Velardi , V. Nassisi

Titolo volume/Rivista

APPLIED PHYSICS. A, MATERIALS SCIENCE & PROCESSING

Anno di pubblicazione

2010

ISSN

0947-8396

ISBN

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Numero di citazioni Wos

Nessuna citazione

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Numero di citazioni Scopus

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Settori ERC

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Codici ASJC

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